Growth mechanisms and characteristics of Sm2O3 based on Ge semiconductor through oxidation and nitridation Academic Article

http://dx.doi.org/10.1016/j.apsusc.2021.148949

authors

Onik, Tahsin Ahmed Mozaffor
Hawari, Huzein Fahmi bin
Sabri, Mohd Faizul Mohd
Wong, Yew Hoong

publication date

2021

published in

Applied Surface Science Journal

Digital Object Identifier (DOI)

https://doi.org/10.1016/j.apsusc.2021.148949

start page

148949

volume

544